Application of oxygen lAD using a new high-power gridless plasma source
نویسنده
چکیده
An improved plasma source for use with oxygen and other gasses has shown great stability at ion power levels almost an order of magnitude above those of the other commercially available gridless sources. The original motivation for this work was to obtain as powerful a source of oxygen ions with neutralizing electrons (plasma source) for the reactive deposition of Si02 from SiO. The results are also applicable to other gasses such as nitrogen, argon, etc., and other deposition materials. The characterization of the source in detail by the use ofthe Design ofExperiments methodology is discussed.
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